Please use this identifier to cite or link to this item:
Files in This Item:
File Description SizeFormat 
Estudo da decomposição fotoquímica por exposição à luz.pdf386.25 kBAdobe PDFThumbnail
Type: Artigo de Periódico
Title: Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
Other Titles: Photodecomposition by ultraviolet exposure of positive photoresists
Author: Borges, Bruno Gabriel Alves Leite
Rocco, Maria Luiza Miranda
Pinho, Roberto Rosas
Lima, Carlos Raimundo
Resumo: -
Abstract: Positive photoresists are widely used in lithographic process in microelectronics and in optics for the fabrication of relief components. With the aim of identifying molecular modifications among positive photoresists unexposed and previously exposed to ultraviolet light the electron stimulated ion desorption technique coupled to time-of-flight mass spectrometry was employed in the study of the AZ-1518 photoresist. Mass spectra were obtained as a function of the electron beam energy, showing specific changes related to the photochemical decomposition of the photoresist. This reinforces the applicability of the technique to investigate and characterize structural changes in photosensitive materials.
Keywords: AZ-1518 photoresist
Time-of-flight mass spectrometry
CNPq: -
Language: por
Country: Brasil
Publisher: -
Institution Initials: -
Access Type: Acesso Aberto
Issue Date: 2012
Appears in Collections:Artigos de Periódicos

Items in DSpace are protected by Creative Commons licenses, with all rights reserved, unless otherwise indicated.