Síntese e estudo raman de grafeno bicamada rodado sob influência e campo eléctrico

Abstract

In this work, we have employed, both, Low Pressure Chemical Vapor Deposition, (LPCVD) as well as Ambient Pressure Chemical Vapor Deposition (APCVD) to produce large areas of twisted bi-layer graphene. LPCVD allowed us to produce highly crystalline monolayer graphene. However, by using APCVD we were able to obtain twisted bi-layer graphene as large as ≈100 𝜇𝑚. All the materials synthesized were carefully analyzed by optical microscopy and Raman spectroscopy. Once we were able to produce ideals bi-layer twisted graphene films; we transferred these materials to a field effect transistor (FET) device. Then we studied the graphene Raman features as a function of the gate voltage. As expected, we observed that the Kohn anomaly was removed by doping graphene by either holes or electrons. Also, the G band phonon lifetime tends to increase as a function of the gate voltage for both monolayer and twisted bi-layer graphene. It seems that large angle twisted bi-layer graphene 20°≤𝜃≤30° has a Raman behavior, when back-gated, very similar to monolayer graphene. Which seems to be consistent with the fact that those sample behave as two uncoupled monolayer graphene. Even though, we could prove that our FET device was working properly, we could not obtain significant modification of the Raman band features for twisted bi-layer with small angles (𝜃<7,5°).